Welcome

About

I am Ryohei Nagahiro, a postdoctoral researcher at the University of Tokyo, specializing in thermal transport at interfaces and thermoelectric materials. My research focuses on understanding and controlling nanoscale heat transport, with particular emphasis on thermal boundary resistance in bulk and polycrystalline silicon. I develop and apply advanced optical thermal metrology, including the Gibbs Excess approach, to reveal local energy dissipation mechanisms relevant to sustainable energy and device design.

Research Interests

Development of Silicon Thermoelectric Materials and Heat Transport Control
Interfacial thermal transport and thermal boundary resistance
Spatially resolved thermal metrology (FDTR, thermoreflectance)
Mass transport in hygroscopic materials

Research topics schematic

Representative Publications

R. Nagahiro, B. Xu, S. Terashima, Y. Li, Y. Li, Y. Liao, Z. Fang, C. Shao, M. Ohnishi, S. Kato, E. Iwase, J. Shiomi, “Module-scale silicon 3D softened nanoarchitectures for eco-friendly thermoelectric energy harvesting”, Materials Today Physics, 57, 101798, (2025). https://doi.org/10.1016/j.mtphys.2025.101798

E. Isotta, S. Jiang, R. Bueno Villoro, R. Nagahiro, K. Maeda, D. A. Mattlat, A. R. Odufisan, A. Zevalkink, J. Shiomi, S. Zhang, C. Scheu, G. J. Snyder, O. Balogun,　“Heat transport at silicon grain boundaries”,　Advanced Functional Materials 34 (40), 2405413 (2024). https://doi.org/10.1002/adfm.202405413

R. Nagahiro, N. Rosli, Y. Hangai, A. Yano, K. Amagai, ”Uniform Heating Model Analysis for the Formation Process of Aluminium Foam by Spot-Type Halogen Lamp”, International Journal of Automotive and Mechanical Engineering 16 (4), 7170-7180 (2019). https://doi.org/10.15282/ijame.16.4.2019.02.0536

(→ Full list on the Publications page)

News

2026-01-12: Website launched (under construction).